by Le, T., Kurt, O., Ouyang, J., Wang, J., Chen, L.-Q., Lin, E.L., Ekerdt, J.G. and Ren, Y.
Reference:
Le, T., Kurt, O., Ouyang, J., Wang, J., Chen, L.-Q., Lin, E.L., Ekerdt, J.G. and Ren, Y., "Engineering nanoscale polarization at the SrTiO3/Ge interface", In Scripta Materialia, vol. 178, pp. 489-492, 2020.
Bibtex Entry:
@ARTICLE{Le2020489,
author={Le, T. and Kurt, O. and Ouyang, J. and Wang, J. and Chen, L.-Q. and Lin, E.L. and Ekerdt, J.G. and Ren, Y.},
title={Engineering nanoscale polarization at the SrTiO3/Ge interface},
journal={Scripta Materialia},
year={2020},
volume={178},
pages={489-492},
doi={10.1016/j.scriptamat.2019.12.033},
url={https://www.scopus.com/inward/record.uri?eid=2-s2.0-85077305975&doi=10.1016%2fj.scriptamat.2019.12.033&partnerID=40&md5=e6e763fcafee49ad5cf45ea44ac5e7f1},
language={English},
document_type={Article},
source={Scopus},
}